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The use of silane gas

- Jan 30, 2018 -

With the development and application of a series of new technologies and products, silane gas has become the basic raw material of information, new materials, energy and environmental science, and is indispensable for many future industries. Its position in modern science and modern industry is very important.


Silane gas was discovered in 1857 and has almost no use in industrial production for the next 100 years or so. It was not until 1950s that because of the development of semiconductor technology, it began to be applied in the production of electronic industry. In 1980s, the semiconductor industry developed rapidly, and the amount of silane gas increased rapidly. The sales of international silane gas market in 1984 was 70t, and increased to 110t in 1986, increasing at a rate of 12% to 15% a year. The worldwide sales of silane gas in the world were 240t in 1990. The application of silane gas in China started late. At present, the consumption of silane is about tens of tons a year.

The application of silane gas in the field of semiconductor manufacturing

1. preparation of silicon dioxide film (SiO2)

2. preparation of silicon nitride passivation film (Si3N4)

3. silane epitaxy

4. preparation of high purity polysilicon

The application of silane gas in other industries

1. Applied to the glass industry

Coated glass is a new kind of energy saving and decorative material, which is widely used in the doors and windows of high grade buildings and exterior walls. A MIT study in the United States pointed out that the cost of heat loss per year for ordinary float glass was $7 /m2. The coated glass can be reduced to $3.2 /m2.

Early building coating glass is made of chromium, titanium, stainless steel, aluminum, gold, silver, copper and other metal or alloy materials as coatings. At present, coated glass coated with TiO2, SnO2, Zn and other dielectric materials is developed, and silicon is introduced into this field.

It uses the atmospheric thermal decomposition CVD preparation method, with 5 mm thick float glass substrate, as the raw material to the volume fraction of 10% and 90% respectively for gas mixture of silane and nitrogen gas, 99.9% purity ethylene (C2H4) as doping gas, deposition parameters: reaction temperature of 620~640, ethylene and silane the gas volume ratio of 0.2:1.3, 400mL/min mixed gas flow rate, chamber pressure is 81.06 kPa.

The coated glass has a Si/SIiC nanocomposite structure, with good appearance and good chemical stability.

Two. Applied to amorphous silicon solar cells

Amorphous silicon solar cells usually use stainless steel sheet or glass as substrate. Under glow discharge, silane gas grows on stainless steel or glass surface, a layer of amorphous silicon (also called amorphous silicon), which forms the original plate of amorphous silicon solar cell. Its characteristics: low price and high photoelectric conversion rate.

The Harbin - Krona solar power company is using silane gas to produce solar cells. At present, the production capacity is 1 million 600 thousand peak watts per year. The annual consumption of silane gas is considerable.

Three. The photosensitive components applied to the copier

The traditional photocopier photosensitive components are prepared by the rare element selenium and cadmium. The trend of future development may be completely replaced by silicon drums prepared by silane gas. Compared with the toner drum, the silicon drum has the following advantages:



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