Nitrogen Trifluoride (NF3) High Purity Gas
Basic Information
|
CAS |
7783-54-2 |
|
EC |
232-007-1 |
|
UN |
2451 |
What is this material ?
Nitrogen trifluoride (NF3) is a colorless and odorless gas at room temperature and atmospheric pressure. It can be liquefied under moderate pressure. NF3 is stable under normal conditions and does not decompose readily. However, it can decompose when exposed to high temperatures or in the presence of certain catalysts. NF3 has a high global warming potential (GWP) when released into the atmosphere.
Where to use this material ?
Cleaning agent in the electronics industry: NF3 is widely used as a cleaning agent for removing residual contaminants, such as oxides, from the surfaces of semiconductors, plasma display panels (PDPs), and other electronic components. It can effectively clean these surfaces without damaging them.
Etching gas in semiconductor fabrication: NF3 is used as an etching gas in the manufacturing process of semiconductors. It is particularly effective in etching silicon dioxide (SiO2) and silicon nitride (Si3N4), which are common materials used in the fabrication of integrated circuits.
Production of high-purity fluorine compounds: NF3 is a valuable source of fluorine for the production of various fluorine-containing compounds. It is used as a precursor in the production of fluoropolymers, fluorocarbons, and specialty chemicals.
Plasma generation in flat panel display manufacturing: NF3 is used along with other gases to create plasma in the production of flat panel displays, such as liquid crystal displays (LCDs) and PDPs. The plasma is essential in the deposition and etching processes during panel fabrication.
Note that specific applications and regulations for the use of this material/product may vary by country, industry and purpose. Always follow safety guidelines and consult an expert before using this material/product in any application.
